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Substrate heater Product List

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BH Series [High-Temperature Thin Film Experiment Substrate Heating Heater] Max 1800℃

This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.

High vacuum compatible with a variety of heater material options. Applicable for various vacuum thin film experiments such as PVD (sputtering, evaporation, EB, etc.), CVD, high-temperature vacuum annealing, and high-temperature sample analysis substrate stages. Custom-made solutions are available to meet various specifications. 【Features】 ● Semi-custom product. Designed and manufactured according to your requirements. ● Easy replacement of spare heater wires. ● Easy installation and maintenance (M6 stud bolts, supports). ● Compatible with RF/DC bias and substrate rotation. 【Standard Accessories】 ● Thermocouple: wire type with alumina insulating sleeve. ● Mounting stud bolts. 【Options】 ● RF (150W)/DC (1KW) bias application. ● Non-standard heater wires (Nb, Mo, Pt/Re, WRe, etc.). ● Substrate holding clips. ● Mounting brackets. ● Substrate holders. ● Tapped holes for holder installation. ● Change of top plate material (PBN, quartz, carbon, Inconel, etc.). ● Additional thermocouples for overheating protection. ● Base flange, vacuum feedthrough.

  • Heating device
  • Substrate heater

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Ultra-high vacuum and oxidation atmosphere compatible substrate heating heater

Large-scale heaters, support for custom shapes, installation of surface treatment mechanisms, and connection to vacuum devices are all possible!

This product is a clean heater with high control responsiveness and an extremely low gas emission structure. It is compatible with both direct sample irradiation heating and hot plate indirect heating. It has a small heat capacity and can be used in ultra-high vacuum, atmospheric pressure, and oxygen atmosphere. 【Features】 ■ Halogen lamp capable of uniform irradiation ■ Economical and highly energy-efficient heater with high responsiveness ■ Composed of quartz body lamp and high-temperature compatible metal reflector and base ■ Structure with extremely low gas emission ■ Capable of heating up to a maximum temperature of 900°C (temperature control measurement point, in vacuum) ■ Very high control responsiveness *For more details, please refer to the PDF document or feel free to contact us.

  • Other heaters
  • Substrate heater

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[SH High-Temperature Substrate Heater] For PVD, CVD Max 1100℃

CVD, PVD (evaporation, sputtering, etc.) high vacuum, ultra-high temperature plate heater for wafer and small chip heating with excellent uniformity and reproducibility.

This is a film deposition device and high vacuum compatible hot plate for vacuum thin film experiments, featuring a heater plate made of Inconel or BN plate, with excellent thermal radiation efficiency and superior uniformity. 【Product Lineup】 ◎ SH-IN (Inconel Plate): φ1.0 to φ6.1 inch for vacuum, O2, and active gases ◎ SH-BN (BN Plate, Mo Cover): φ2.1 to φ6.1 inch for vacuum and inert gases 【Features】 ◎ Maximum temperature 1100℃ (SH-BN), 850℃ (SH-IN) ◎ Rapid heating ◎ In-plane temperature distribution within ±2% ◎ Control accuracy and reproducibility ±1℃ ◎ Low cost ◎ Short delivery time (standard about 2 weeks *excluding flanges, rotation and vertical mechanisms, mounting brackets, etc.)

  • Other semiconductor manufacturing equipment
  • Annealing furnace
  • CVD Equipment
  • Substrate heater

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